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E-200m Upright Trinocular Metallographic Microscope with Lwd Lens

China E-200m Upright Trinocular Metallographic Microscope with Lwd Lens, Find details about China Metallographic Microscope, Trinocular Microscope from E-200m Upright Trinocular Metallographic Microscope with Lwd Lens

Model NO.
E-200M
Shape
Cylindrical Shaped Lens
Usage
Metallurgical, Teaching, Scientific Research, QC
Principle
Optics
Principle of Optics
Polarizing Microscope
Eyepiece
High Eyepoint Plan Eyepiece Pl10X
Viewing Head
Gemel Binocular, 30 Inclined, 360 Rotating
Objective
Lwd Plan Achromatic Metallurgical Objective
Nosepiece
Quadruple Nosepiece (Four Holes)
Focus
Coaxial Coarse and Fine Adjustment
Filter
Blue, Green, Yellow
Illumination
6V30W Halogen Bulb, Brightness Is Adjustment
Trademark
EBP
Transport Package
Carton Box
Specification
Finity color corrected optical system
Origin
Zhejiang, China
HS Code
9011800090
Model NO.
E-200M
Shape
Cylindrical Shaped Lens
Usage
Metallurgical, Teaching, Scientific Research, QC
Principle
Optics
Principle of Optics
Polarizing Microscope
Eyepiece
High Eyepoint Plan Eyepiece Pl10X
Viewing Head
Gemel Binocular, 30 Inclined, 360 Rotating
Objective
Lwd Plan Achromatic Metallurgical Objective
Nosepiece
Quadruple Nosepiece (Four Holes)
Focus
Coaxial Coarse and Fine Adjustment
Filter
Blue, Green, Yellow
Illumination
6V30W Halogen Bulb, Brightness Is Adjustment
Trademark
EBP
Transport Package
Carton Box
Specification
Finity color corrected optical system
Origin
Zhejiang, China
HS Code
9011800090
E-200M Upright Trinocular Metallographic Microscope With LWD Lens
 
Introduction:
1. Plan achromatic optics and Epi Kohler illumination system and anti-reflective structure in the epi-illumination system, can make the image clarity better contrast of field of view. And effectively prevent interference by stray light.
2. The stable and reliable operating mechanism provide clearer image and easier to operate.
3. Modular microscope body with a new ergonomic design, structural symmetry, can used with many kinds of accessories.
4. Stage, light intensity and low position coarse and fine adjustment, increased comfort of operating.
5. Widely used in various types of semi-conductor silicon wafer inspection, material- s science study, geology mineral analysis and precision engineering and other disciplines.

Technical specifications:
Optical systemFinity color corrected optical system
Viewing headGemel binocular, 30°inclined, 360°rotating, Interpupillary distance adjustable between 54-75mm, Diopter adjustment ±5 for each side;
Gemel trinocular, refract rate, binocular: trinocular = 80% : 20%
EyepieceHigh eyepoint plan eyepiece PL10X, view of field 18mm
ObjectiveLWD plan achromatic metallurgical objective 5X, 10X, 20X, 50X
NosepieceQuadruple nosepiece (4 holes)
Focusing adjustmentCoaxial coarse and fine adjustment.with coarse adjustment stop and tightness adjustment. Coarse adjustment range:28mm,precision of fine adjustment: 0.002mm
StageMechanical stage 140x132mm,with 180X145mm deck platform, moving range: 76mmX50mm, accuracy: 0.1mm
Illumination systemReflected Kohler illumination, Adaptation wide voltage 90V-240V, 6V/30W halogen bulb, brightness adjustable, with iris diaphragm and field diaphragm, the center of field diaphragm adjustable
FilterBlue, green, yellow
E-200m Upright Trinocular Metallographic Microscope with Lwd Lens

E-200m Upright Trinocular Metallographic Microscope with Lwd Lens
E-200m Upright Trinocular Metallographic Microscope with Lwd Lens

 

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