China Mini Compact Desktop Magnetron Plasma Sputtering Coater, Find details about China Mini Magnetron Sputtering System, Desktop Magnetron Sputtering Machine from Mini Compact Desktop Magnetron Plasma Sputtering Coater
| Input Power | Single phase 208 - 240 VAC, 50 / 60 Hz < 1000 W (including vacuum pump) |
| Vacuum Chamber | Vacuum chamber: 100 mm ID x 130 mm H, made of fused glass Sealing flange made of stainless Needle valve on front panel for gas flow control |
| Sample Stage | Stage size: 40 mm Dia. Sputtering distance range: 15 - 80 mm adjustable |
| Control Panel | Vacuum gauge and sputtering current meter for monitoring deposition Needle valve on front panel for gas flow control Sputtering timer: 0 - 110 s adjustable |
| Vacuum Pump | The followings are included: 156 L/m Double Stage Rotary Vane Vacuum Pump with vapor trap (Max vacuum 10^-2 Torr) Stainless steel bellows with KF16 adapter and quick clamps Two Stage Exhaust Filter on vacuum pump to eliminate oil vapor contamination One High purity Au target (57 mm Dia. x 0.12 mm, 4N purity) Optional: you may use a turbo pump to achieve 10^-4 Torr vacuum by a turbo pump |
| Sputtering Targets | Target size requirements: 57 mm Dia. x 0.5 mm max 4N purity gold foil: 57 mm Dia. x 0.12 mm (Included and pre-installed on coater) Optional Targets are available Au target (57 mm Dia. x 0.12 mm, 4N purity) Pt target (57 mm Dia. x 0.12 mm, 4N purity) Ag target (57 mm Dia. x 0.5 mm, 4N purity) |
| Size | 480 mm L x 320 mm W x 280 mm H |
| Net Weight | 20 kg |
| Shipping Weight | 55 kg (120 lbs) with 1020 mm x 790 mm x 560 mm (40" x 31" x 22") |
| Compliance | CE approval |