Vacuum Vapor Deposition /Magnetron Sputtering Machine with Planar Source Vacuum Vapor Deposition Technology
China Vacuum Vapor Deposition /Magnetron Sputtering Machine with Planar Source Vacuum Vapor Deposition Technology, Find details about China Machine, Mobile Phone Accessory from Vacuum Vapor Deposition /Magnetron Sputtering Machine with Planar Source Vacuum Vapor Deposition Technology
Basic Info.
Model NO.
PVD-18-01
Trademark
PEROVS
Transport Package
Wooden Box Shockproof
Specification
500-900kg
Origin
Hangzhou
Model NO.
PVD-18-01
Trademark
PEROVS
Transport Package
Wooden Box Shockproof
Specification
500-900kg
Origin
Hangzhou
Product Desciption
100×100mm Magnetron sputtering System
High vacuum magnetron sputtering coating machine using vacuum magnetron sputtering technology, it can be used in a high vacuum background, filled with high-purity argon gas, using magnetron sputtering to prepare a variety of metal films, dielectric films, semiconductor films, but also better sputtering ferromagnetic materials (Fe, Co, Ni), the preparation of magnetic films. Under the coating process conditions, the microcomputer-controlled sample turntable and target baffle can prepare both single-layer films and various multilayer films, which provides a very ideal development means for the field of new materials and thin film science research.
It can be applied to the preparation of thin films for various products, especially for the preparation of thin films for large-area solar cells. It has a large area film preparation, great solvent saving, and a benchtop compact structure designed for scientific research.
High vacuum magnetron sputtering coating machine using vacuum magnetron sputtering technology, it can be used in a high vacuum background, filled with high-purity argon gas, using magnetron sputtering to prepare a variety of metal films, dielectric films, semiconductor films, but also better sputtering ferromagnetic materials (Fe, Co, Ni), the preparation of magnetic films. Under the coating process conditions, the microcomputer-controlled sample turntable and target baffle can prepare both single-layer films and various multilayer films, which provides a very ideal development means for the field of new materials and thin film science research.
| Parameter | Specification | Description |
| Model | PVD-18-01 | Customizable |
| Inner cavity size | 450mm | water cooling,customizable |
| Processing area | Diameter100mm | customizable |
| Ultimate vacuum | 3×10-5Pa | customizable |
| RF power supply | 600W | |
| Film thickness meter | MDC-360C/310C | ±1 Å |
| Equipment power | 5000W | AC220V/50Hz |
| Weight/Packaging | 500-900kg,Wooden box shockproof |
Standard with 100mm diameter permanent magnet target.
Small size and compact structure can save the floor space of the supplied R&D unit.
Can be used for multiple purposes and can be switched with vapor deposition machine.
Small size and compact structure can save the floor space of the supplied R&D unit.
Can be used for multiple purposes and can be switched with vapor deposition machine.
It can be applied to the preparation of thin films for various products, especially for the preparation of thin films for large-area solar cells. It has a large area film preparation, great solvent saving, and a benchtop compact structure designed for scientific research.
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