China 4j29 Strip Be Used in Etching Electronic Components Match Same Coefficient of Expansion, Find details about China Kovar Strip, 4j29 Strip from 4j29 Strip Be Used in Etching Electronic Components Match Same Coefficient of Expansion
Ni | 28.5~29.5 | Fe | Bal. | Co | 16.8~17.8 | Si | ≤0.3 |
Mo | ≤0.2 | Cu | ≤0.2 | Cr | ≤0.2 | Mn | ≤0.5 |
C | ≤0.03 | P | ≤0.02 | S | ≤0.02 |
Code of condition | Condition | Wire | Strip |
R | Soft | ≤585 | ≤570 |
1/4I | 1/4 Hard | 585~725 | 520~630 |
1/2I | 1/2 Hard | 655~795 | 590~700 |
3/4I | 3/4 Hard | 725~860 | 600~770 |
I | Hard | ≥850 | ≥700 |
Density (g/cm3) | 8.2 |
Electrical resistivity at 20ºC(Om*mm2/m) | 0.48 |
Temperature factor of resistivity(20ºC~100ºC)X10-5/ºC | 3.7~3.9 |
Curie point Tc/ ºC | 430 |
Elastic Modulus, E/ Gpa | 138 |
θ/ºC | α1/10-6ºC-1 | θ/ºC | α1/10-6ºC-1 |
20~60 | 7.8 | 20~500 | 6.2 |
20~100 | 6.4 | 20~550 | 7.1 |
20~200 | 5.9 | 20~600 | 7.8 |
20~300 | 5.3 | 20~700 | 9.2 |
20~400 | 5.1 | 20~800 | 10.2 |
20~450 | 5.3 | 20~900 | 11.4 |
θ/ºC | 100 | 200 | 300 | 400 | 500 |
λ/ W/(m*ºC) | 20.6 | 21.5 | 22.7 | 23.7 | 25.4 |
The heat treatment process | |
Annealing for stress relief | Heated to 470~540ºC and hold 1~2 h. Cold down |
annealing | In vacuum heated to 750~900ºC |
Holding time | 14 min~1h. |
Cooling rate | No more than 10 ºC/min cooled to 200 ºC |
Alloys Name | Type | Dimension | |||
OhmAlloy-4J29 | Wire | D= 0.1~8mm | |||
OhmAlloy-4J29 | Strip | W= 5~250mm | T= 0.1mm | ||
OhmAlloy-4J29 | Foil | W= 10~100mm | T= 0.01~0.1 | ||
OhmAlloy-4J29 | Bar | Dia= 8~100mm | L= 50~1000 |