DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

China DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater, Find details about China Dual-Head Magnetron Plasma Sputtering Coater, Mini Magnetron Sputtering Coating Machine from DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

Basic Info.

Model NO.

CY-VTC-600-2HD

Vacuum Chamber

Stainless Steel

Sample Holder

Rotatable

Gas Flow Control

Precision

Warranty

One Year

Trademark

Transport Package

Wooden Box

Specification

dia. 140mm

Origin

Zhengzhou, China

HS Code

8543709990

Model NO.

CY-VTC-600-2HD

Vacuum Chamber

Stainless Steel

Sample Holder

Rotatable

Gas Flow Control

Precision

Warranty

One Year

Trademark

Transport Package

Wooden Box

Specification

dia. 140mm

Origin

Zhengzhou, China

HS Code

8543709990

Product Desciption

DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater
Brief introduction
VTC-600-2HD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source and another RF source.A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE etc. at low cost.
Specification

Input Power	220VAC 50/60Hz, single phase 2000W (including pump)
Source Power	Two sputtering power sources are integrated into one control box DC source: 500W for coating metallic materials RF source: 600W with auto matching for coating non-metallic materials
Magnetron Sputtering Head	Two 2" Magnetron Sputtering Heads are included One is connected to RF power supply for no-conductive materials Another is connected to DC power source for metallic materials Target size requirement: 2" diameter Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets Head Water Cooling: 10ml/min water flow required
Vacuum Chamber	Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel Observation Window: 100 mm diameter Hinged type cover on top with air spring sport
Sample Holder	Sample holder size: 140mm dia. for. 4" wafer max Sample holder rotation speed is adjustable: 1 - 20 rpm The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C
Gas Flow Control	Two precision digital MFC (mass flow controller) are installed
Vacuum Pump Station	High speed turbo vacuum pump system
Thickness Monitor	One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å