Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film

China Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film, Find details about China CVD Machine, Chemical Vapor Deposition from Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film

Model NO.
CY-O1500-60IT-3F-LV
Vacuum Tube Furnace
High Purity Alumina
Tube Diameter
60mm
Tube Length
1000mm
Heating Zone Length
300mm
Operating Temperature
0-1450c
Gas Supply System
Gas Flow Flowmeter
Measurement Accuracy
+-0.2%
Ultimate Vacuum
1.0e-1PA
Rotary Vane Pump
1.1L/S
Trademark
CYKY
Specification
Vacuum high-purity alumina tube
Origin
Zhengzhou Henan China
Model NO.
CY-O1500-60IT-3F-LV
Vacuum Tube Furnace
High Purity Alumina
Tube Diameter
60mm
Tube Length
1000mm
Heating Zone Length
300mm
Operating Temperature
0-1450c
Gas Supply System
Gas Flow Flowmeter
Measurement Accuracy
+-0.2%
Ultimate Vacuum
1.0e-1PA
Rotary Vane Pump
1.1L/S
Trademark
CYKY
Specification
Vacuum high-purity alumina tube
Origin
Zhengzhou Henan China
chemical vapor deposition CVD film machine for semiconductor thin film


Product description of CVD film machine

1500ºC single heating zone low vacuum CVD film machine(CY-O1500-60IT-3F-LV) consists of a 1500ºC single temperature zone tube furnace, a three-channel float flowmeter and a double stage rotary vane vacuum pump. The gaseous reactant is formed by a legal reaction under certain conditions to form a solid phase product deposited on the surface of the substrate to form a solid film.

CVD film machine is controlled by the precision temperature control instrument for PID temperature control. It can edit the 30-segment lifting temperature program and has the function of overheating and short circuit protection. The flanges on both sides of the furnace tube are equipped with a digital vacuum gauge and a mechanical pressure gauge, which can be used to control the atmosphere in the furnace tube. At the same time, the tube furnace is operated by high-definition true color touch screen, which is easy to use. Even non-professionals can master the use of the instrument after simple training, which can greatly improve your experiment efficiency.

The furnace tube of 
CVD film machine is made of high-purity alumina, and the furnace body adopts integrated design. The unique design can ensure the system is stable and safe at 1500ºC. The heating element is made of high-quality silicon carbon rod, which can reach 1500ºC high temperature. If the customer has the need, the silicon molybdenum rod heating element can be customized to achieve a higher temperature of 1700ºC.

The system is equipped with a three-channel float flowmeter, which can mix 1~3 channels of gas to accurately prepare the mixed gas required for the experiment. Another pressure gauge is installed on the front of the float flowmeter to monitor the gas pressure and the mixing tank pressure.

applications:
It is suitable for high-temperature sintering, metal annealing, quality inspection, etc. in universities, research institutes, industrial and mining enterprises, especially for CVD experiments that require a variety of gas mixing atmospheres.
Film preparation from chemical reaction by chemical reaction deposition


Technical parameters of CVD film machine
Vacuum tube   furnaceModelCY-O1500-60IT
Tube materialHigh purity alumina
Tube diameter60mm
Tube length1000mm
Furnace chamber   length400mm
Heating zone   length300mm
Constant   temperature zone150mm
Operating   temperature≤1450ºC
Temperature  control accuracy±1ºC
Temperature   control mode30 or 50 segment program temperature control
Display modeLCD
Sealing   method304 stainless steel vacuum flange
Flange interface1/4" ferrule connector, KF16/25/40 joint
Vacuum4.4×10E-3Pa
Power supplyAC:220V   50/60Hz
Gas supply   systemModelCY-3F
Gas channel3-channel
Measuring   unitGas float   flowmeter
Measuring rangeA channel: 0~100ml H2 gasRemarks: If you need other ranges or gas types, you need to specify when ordering. According to the customer's specific requirements, the flow meter of the   corresponding gas type and range can be selected.
B channel: 16~160ml  N2 gas
C channel: 25~250ml  Ar gas
measurement   accuracy±2.0%
Pipe   pressure resistance3MPa
Working   pressure difference50~300KPa
Connecting   pipe304 stainless steel
Gas channel304 stainless steel needle valve
Interface   specification1/4" ferrule connector for gas inlet and outlet
Exhaust   systemMechanical   pumpRotary vane pump
Pumping rate1.1L/S 
Exhaust   interfaceKF16
Vacuum   measurementResistance gauge
Ultimate   vacuum1.0E-1Pa
Power supplyAC:220V   50/60Hz
Pumping   interfaceKF16

NOTE: According to the needs of the experiment, you can choose the temperature, temperature zone, furnace size, vacuum system, flowmeter



Related photos
of CVD film machine
Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film

Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film
Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film

Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin FilmChemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film
Founded in 2005, Zhengzhou CY Scientific Instrument Co., Ltd. is a company specializing in the development and production of laboratory technology research equipment. The products are mixed, pressed, burned, cut, ground, polished, coated, analytical equipment and related consumables. Products include laboratory sintering equipment, coating equipment and so on. At present, it has been exported to 25 countries and regions such as the United States, Europe, and Southeast Asia, and has been well received by various scientific research units.

We have a mature technology research and development team, the number of technicians is 33, the company has 150 people, more than 500 square meters of office space, the factory covers an area of about 1,500 square meters located in Zhengzhou High-tech Zone Electronic Industrial Park. The products are mainly located in the research market, serving scientific research in the labs of universities and colleges, and can also customize products according to your needs.

Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film

Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film
Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film

Q. Are you a manufacturer or a trading company?
A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?
A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?
A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?
A.T / T, L / C, D / P, etc., it is recommended to use Alibaba Trade Guarantee.

Q. How is the package of goods? Delivery methods?
A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact customer service