China Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film, Find details about China CVD Machine, Chemical Vapor Deposition from Chemical Vapor Deposition (CVD) Film Machine for Semiconductor Thin Film
Vacuum tube furnace | Model | CY-O1500-60IT | |
Tube material | High purity alumina | ||
Tube diameter | 60mm | ||
Tube length | 1000mm | ||
Furnace chamber length | 400mm | ||
Heating zone length | 300mm | ||
Constant temperature zone | 150mm | ||
Operating temperature | ≤1450ºC | ||
Temperature control accuracy | ±1ºC | ||
Temperature control mode | 30 or 50 segment program temperature control | ||
Display mode | LCD | ||
Sealing method | 304 stainless steel vacuum flange | ||
Flange interface | 1/4" ferrule connector, KF16/25/40 joint | ||
Vacuum | 4.4×10E-3Pa | ||
Power supply | AC:220V 50/60Hz | ||
Gas supply system | Model | CY-3F | |
Gas channel | 3-channel | ||
Measuring unit | Gas float flowmeter | ||
Measuring range | A channel: 0~100ml H2 gas | Remarks: If you need other ranges or gas types, you need to specify when ordering. According to the customer's specific requirements, the flow meter of the corresponding gas type and range can be selected. | |
B channel: 16~160ml N2 gas | |||
C channel: 25~250ml Ar gas | |||
measurement accuracy | ±2.0% | ||
Pipe pressure resistance | 3MPa | ||
Working pressure difference | 50~300KPa | ||
Connecting pipe | 304 stainless steel | ||
Gas channel | 304 stainless steel needle valve | ||
Interface specification | 1/4" ferrule connector for gas inlet and outlet | ||
Exhaust system | Mechanical pump | Rotary vane pump | |
Pumping rate | 1.1L/S | ||
Exhaust interface | KF16 | ||
Vacuum measurement | Resistance gauge | ||
Ultimate vacuum | 1.0E-1Pa | ||
Power supply | AC:220V 50/60Hz | ||
Pumping interface | KF16 |